Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition
Journal of Applied Physics
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sg-nus-scholar.10635-963322024-11-08T21:39:54Z Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition Liu, J.-M. Ong, C.K. PHYSICS Journal of Applied Physics 84 10 5560-5565 JAPIA 2014-10-16T09:22:13Z 2014-10-16T09:22:13Z 1998-11-15 Article Liu, J.-M.,Ong, C.K. (1998-11-15). Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition. Journal of Applied Physics 84 (10) : 5560-5565. ScholarBank@NUS Repository. 00218979 http://scholarbank.nus.edu.sg/handle/10635/96332 NOT_IN_WOS Scopus |
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PHYSICS Liu, J.-M. Ong, C.K. |
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Liu, J.-M. Ong, C.K. |
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Liu, J.-M. Ong, C.K. Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
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Liu, J.-M. |
title |
Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
title_short |
Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
title_full |
Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
title_fullStr |
Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
title_full_unstemmed |
Effect of oxygen stoichiometry on the electrical property of thin film La0.5Sr0.5CoO3 prepared by pulsed laser deposition |
title_sort |
effect of oxygen stoichiometry on the electrical property of thin film la0.5sr0.5coo3 prepared by pulsed laser deposition |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/96332 |
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1821232297685286912 |