APA引文

van Kan, J., Bettiol, A., Watt, F., & PHYSICS. (2014). Hydrogen silsesquioxane a next generation resist for proton beam writing at the 20 nm level.

Chicago Style Citation

van Kan, J.A., A.A Bettiol, F. Watt, and PHYSICS. Hydrogen Silsesquioxane a Next Generation Resist for Proton Beam Writing At the 20 Nm Level. 2014.

MLA引文

van Kan, J.A., A.A Bettiol, F. Watt, and PHYSICS. Hydrogen Silsesquioxane a Next Generation Resist for Proton Beam Writing At the 20 Nm Level. 2014.