The migration of self-interstitials in germanium
Journal of Physics and Chemistry of Solids
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sg-nus-scholar.10635-982952015-01-31T02:21:45Z The migration of self-interstitials in germanium Khoo, G.S. Ong, C.K. PHYSICS defects in Ge Diffusion semiconductors Journal of Physics and Chemistry of Solids 51 10 1177-1179 JPCSA 2014-10-16T09:45:22Z 2014-10-16T09:45:22Z 1990 Article Khoo, G.S.,Ong, C.K. (1990). The migration of self-interstitials in germanium. Journal of Physics and Chemistry of Solids 51 (10) : 1177-1179. ScholarBank@NUS Repository. 00223697 http://scholarbank.nus.edu.sg/handle/10635/98295 NOT_IN_WOS Scopus |
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defects in Ge Diffusion semiconductors |
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defects in Ge Diffusion semiconductors Khoo, G.S. Ong, C.K. The migration of self-interstitials in germanium |
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Journal of Physics and Chemistry of Solids |
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PHYSICS |
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PHYSICS Khoo, G.S. Ong, C.K. |
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Article |
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Khoo, G.S. Ong, C.K. |
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Khoo, G.S. |
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The migration of self-interstitials in germanium |
title_short |
The migration of self-interstitials in germanium |
title_full |
The migration of self-interstitials in germanium |
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The migration of self-interstitials in germanium |
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The migration of self-interstitials in germanium |
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migration of self-interstitials in germanium |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98295 |
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