Thermal contact resistance across nanoscale silicon dioxide and silicon interface

10.1063/1.4754513

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Main Authors: Chen, J., Zhang, G., Li, B.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98351
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-983512023-10-26T21:13:03Z Thermal contact resistance across nanoscale silicon dioxide and silicon interface Chen, J. Zhang, G. Li, B. PHYSICS 10.1063/1.4754513 Journal of Applied Physics 112 6 - JAPIA 2014-10-16T09:46:04Z 2014-10-16T09:46:04Z 2012-09-15 Article Chen, J., Zhang, G., Li, B. (2012-09-15). Thermal contact resistance across nanoscale silicon dioxide and silicon interface. Journal of Applied Physics 112 (6) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4754513 00218979 http://scholarbank.nus.edu.sg/handle/10635/98351 000309423200137 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.4754513
author2 PHYSICS
author_facet PHYSICS
Chen, J.
Zhang, G.
Li, B.
format Article
author Chen, J.
Zhang, G.
Li, B.
spellingShingle Chen, J.
Zhang, G.
Li, B.
Thermal contact resistance across nanoscale silicon dioxide and silicon interface
author_sort Chen, J.
title Thermal contact resistance across nanoscale silicon dioxide and silicon interface
title_short Thermal contact resistance across nanoscale silicon dioxide and silicon interface
title_full Thermal contact resistance across nanoscale silicon dioxide and silicon interface
title_fullStr Thermal contact resistance across nanoscale silicon dioxide and silicon interface
title_full_unstemmed Thermal contact resistance across nanoscale silicon dioxide and silicon interface
title_sort thermal contact resistance across nanoscale silicon dioxide and silicon interface
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98351
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