Thermal contact resistance across nanoscale silicon dioxide and silicon interface
10.1063/1.4754513
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sg-nus-scholar.10635-983512023-10-26T21:13:03Z Thermal contact resistance across nanoscale silicon dioxide and silicon interface Chen, J. Zhang, G. Li, B. PHYSICS 10.1063/1.4754513 Journal of Applied Physics 112 6 - JAPIA 2014-10-16T09:46:04Z 2014-10-16T09:46:04Z 2012-09-15 Article Chen, J., Zhang, G., Li, B. (2012-09-15). Thermal contact resistance across nanoscale silicon dioxide and silicon interface. Journal of Applied Physics 112 (6) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4754513 00218979 http://scholarbank.nus.edu.sg/handle/10635/98351 000309423200137 Scopus |
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10.1063/1.4754513 |
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PHYSICS |
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PHYSICS Chen, J. Zhang, G. Li, B. |
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Article |
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Chen, J. Zhang, G. Li, B. |
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Chen, J. Zhang, G. Li, B. Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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Chen, J. |
title |
Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
title_short |
Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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Thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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thermal contact resistance across nanoscale silicon dioxide and silicon interface |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98351 |
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