Focussed-Ion-Beam Post Processing Technology for Active Devices

• المؤلفون الرئيسيون: TEE, Chyng Wen, Lau, F. K., Zhao, X., Penty, R. V., White, I. H.
• التنسيق: text
• اللغة: English
• منشور في: Institutional Knowledge at Singapore Management University 2006
• الموضوعات: Computing systems; Dielectrics; Etching; Feedback; Ion beams; Lasers; Lenses; Metals; Mirrors; Optical interconnects; Physical Sciences and Mathematics
• الوصول للمادة أونلاين: https://ink.library.smu.edu.sg/lkcsb_research/3336; https://doi.org/10.1117/12.691640

Focused ion beam (FIB) etching technology is a highly efficient post-processing technique with the functionality to perform sputter etching and deposition of metals or insulators by means of a computer-generated mask. The high resolution and the ability to remove material directly from the sample in...