Optimization of DC magnetron sputtering deposition process and surface properties of HA-TiO<inf>2</inf> film

• المؤلفون الرئيسيون: Premphet P., Prasoetsri M., Boonyawan D., Supruangnet R., Udomsom S., Leksakul K.
• التنسيق: وقائع المؤتمر
• منشور في: 2017
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85028403612&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/40985
• المؤسسة: Chiang Mai University

© 2017 Elsevier Ltd. All rights reserved. Hydroxyapatite (HA) and Titanium (Ti) thin film was fabricated by a pulsed DC magnetron sputtering technique. To synthesize a thin film that compatible with bone cell, optimize parameter of the sputtering process and study of the film properties were carried...