Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering

© 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the...

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Main Authors: Boonyawan D., Waruriya P., Suttiat K.
Format: Journal
Published: 2017
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84971632038&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/41302
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-413022017-09-28T04:20:27Z Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering Boonyawan D. Waruriya P. Suttiat K. © 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the optical emission spectroscopy (OES). The relationship between the chemical composition of plasma to sputtering pressure, discharge voltage, duty cycle and the content of nitrogen gas were considered. The plasma emission intensity raised to the maximum level when the N 2 content was 0.6 sccm. The voltage was ranged about 500–700 V for the sputtering pressure at 3–7 mTorr and reduced to below 500 V when the pressure increased to more than 7 mTorr. The clear as-deposited films with high refractive index were observed and found to reduce surface contact angle as much lower as 10°. X-ray photoelectron spectroscopy (XPS) result revealed TiOH was also formed in the deposited film besides TiO 2 . 2017-09-28T04:20:27Z 2017-09-28T04:20:27Z 2016-11-25 Journal 02578972 2-s2.0-84971632038 10.1016/j.surfcoat.2016.05.063 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84971632038&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/41302
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
description © 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the optical emission spectroscopy (OES). The relationship between the chemical composition of plasma to sputtering pressure, discharge voltage, duty cycle and the content of nitrogen gas were considered. The plasma emission intensity raised to the maximum level when the N 2 content was 0.6 sccm. The voltage was ranged about 500–700 V for the sputtering pressure at 3–7 mTorr and reduced to below 500 V when the pressure increased to more than 7 mTorr. The clear as-deposited films with high refractive index were observed and found to reduce surface contact angle as much lower as 10°. X-ray photoelectron spectroscopy (XPS) result revealed TiOH was also formed in the deposited film besides TiO 2 .
format Journal
author Boonyawan D.
Waruriya P.
Suttiat K.
spellingShingle Boonyawan D.
Waruriya P.
Suttiat K.
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
author_facet Boonyawan D.
Waruriya P.
Suttiat K.
author_sort Boonyawan D.
title Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
title_short Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
title_full Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
title_fullStr Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
title_full_unstemmed Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
title_sort characterization of titanium nitride–hydroxyapatite on peek for dental implants by co-axis target magnetron sputtering
publishDate 2017
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84971632038&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/41302
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