Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process

Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process

© 2015 The Japan Society of Applied Physics. Looking into the aspect of material processing, this work evaluates alternative plasma concepts in SiH < inf > 4 < /inf > /H < inf > 2 < /inf > plasmas to investigate the radical and plasma generation in the plasma enhanced chemic...

Full description

Saved in:
Bibliographic Details
Main Authors: Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han, Masaru Hori
Format: Journal
Published: 2018
Subjects:
Agricultural and Biological Sciences
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84933555767&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/44788
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Chiang Mai University
id th-cmuir.6653943832-44788
record_format dspace
spelling th-cmuir.6653943832-447882018-04-25T07:55:28Z Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori Agricultural and Biological Sciences © 2015 The Japan Society of Applied Physics. Looking into the aspect of material processing, this work evaluates alternative plasma concepts in SiH < inf > 4 < /inf > /H < inf > 2 < /inf > plasmas to investigate the radical and plasma generation in the plasma enhanced chemical vapor deposition (PECVD) synthesis of nanocrystalline Si (nc-Si:H). Simultaneous measurements by vacuum ultraviolet absorption spectroscopy (VUVAS), optical emission spectroscopy (OES), and radio frequency (RF) compensated Langmuir probe (LP) reveal that RF/ultrahigh frequency (UHF) hybrid source can efficiently produce H radicals and plasmas that are accountable for nc-Si:H film synthesis. The efficacy of hybrid plasmas is also discussed. 2018-01-24T04:48:04Z 2018-01-24T04:48:04Z 2015-01-01 Journal 13474065 00214922 2-s2.0-84933555767 10.7567/JJAP.54.076201 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84933555767&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/44788
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Agricultural and Biological Sciences
spellingShingle Agricultural and Biological Sciences
Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
description © 2015 The Japan Society of Applied Physics. Looking into the aspect of material processing, this work evaluates alternative plasma concepts in SiH < inf > 4 < /inf > /H < inf > 2 < /inf > plasmas to investigate the radical and plasma generation in the plasma enhanced chemical vapor deposition (PECVD) synthesis of nanocrystalline Si (nc-Si:H). Simultaneous measurements by vacuum ultraviolet absorption spectroscopy (VUVAS), optical emission spectroscopy (OES), and radio frequency (RF) compensated Langmuir probe (LP) reveal that RF/ultrahigh frequency (UHF) hybrid source can efficiently produce H radicals and plasmas that are accountable for nc-Si:H film synthesis. The efficacy of hybrid plasmas is also discussed.
format Journal
author Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
author_facet Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
author_sort Kyung Sik Shin
title Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
title_short Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
title_full Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
title_fullStr Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
title_full_unstemmed Utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
title_sort utility of dual frequency hybrid source for plasma and radical generation in plasma enhanced chemical vapor deposition process
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84933555767&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/44788
_version_ 1681422624360497152

Similar Items