Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation

• Main Authors: D. Bootkul, P. Jitsopakul, S. Intarasiri, D. Boonyawan
• Format: Journal
• Published: 2018
• Subjects: Agricultural and Biological Sciences; Arts and Humanities
• Online Access: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85029359113&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/46966
• Institution: Chiang Mai University

© 2017 Elsevier B.V. Preparation of ultrathin alumina (Al 2 O 3 ) films through Plasma-Enhanced Atomic Layer Deposition (PE-ALD) at low substrate temperature is discussed. The present work aims to investigate the physical mechanism of the PE-ALD deposition process and also the characteristics of the...