Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protons

• المؤلفون الرئيسيون: Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
• التنسيق: دورية
• منشور في: 2018
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84869083589&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/48137
• المؤسسة: Chiang Mai University

For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence irradiation conditions. In this report, we outline o...