Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation co...

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Bibliographic Details
Main Authors: Somrit Unai, Nitipon Puttaraksa, Nirut Pussadee, Kanda Singkarat, Michael W. Rhodes, Harry J. Whitlow, Somsorn Singkarat
Format: Journal
Published: 2018
Subjects:
Multidisciplinary
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84857303811&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/52044
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Institution: Chiang Mai University

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https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84857303811&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/52044

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