Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation co...

Full description

Saved in:
Bibliographic Details
Main Authors: Unai S., Puttaraksa N., Pussadee N., Singkarat K., Rhodes M.W., Whitlow H.J., Singkarat S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/6839
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Chiang Mai University
Language: English

Internet

http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/6839

Similar Items