Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

• Main Authors: Unai S., Puttaraksa N., Pussadee N., Singkarat K., Rhodes M.W., Whitlow H.J., Singkarat S.
• Format: Article
• Language: English
• Published: 2014
• Online Access: http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba; http://cmuir.cmu.ac.th/handle/6653943832/6839
• Institution: Chiang Mai University

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation co...