Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films

• المؤلفون الرئيسيون: C. Aramwit, S. Intarasiri, D. Bootkul, U. Tippawan, B. Supsermpol, N. Seanphinit, W. Ruangkul, L. D. Yu
• التنسيق: دورية
• منشور في: 2018
• الموضوعات: Materials Science
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84903309650&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/53631
• المؤسسة: Chiang Mai University

Titanium dioxide (TiO2) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O2) pressure which was varied from a base pressur...