Effect of plasma power on copper substrate used for synthesizing carbon nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) technique

• Main Authors: Sureewan Phunwaree, Wim Nhuapeng, Dheerawan Boonyawan, Wandee Thamjaree
• 格式: 雜誌
• 出版: 2018
• 主題: Biochemistry, Genetics and Molecular Biology; Chemistry; Materials Science; Mathematics; Physics and Astronomy
• 在線閱讀: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84961840164&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/55264

© 2016, Chiang Mai Journal of Science. All Rights Reserved. In this work, the authors attempted to modify a plasma treatment on copper substrate to increase its roughness surface by Low Pressure Plasma Treatment (LPPT). Plasma energy at the radio frequency of 13.56 MHz and the mixing gas between 30%...