Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering
© 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the...
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th-cmuir.6653943832-554072018-09-05T03:12:55Z Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering Dheerawan Boonyawan Panadda Waruriya Kullapop Suttiat Chemistry Materials Science Physics and Astronomy © 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the optical emission spectroscopy (OES). The relationship between the chemical composition of plasma to sputtering pressure, discharge voltage, duty cycle and the content of nitrogen gas were considered. The plasma emission intensity raised to the maximum level when the N2content was 0.6 sccm. The voltage was ranged about 500–700 V for the sputtering pressure at 3–7 mTorr and reduced to below 500 V when the pressure increased to more than 7 mTorr. The clear as-deposited films with high refractive index were observed and found to reduce surface contact angle as much lower as 10°. X-ray photoelectron spectroscopy (XPS) result revealed TiOH was also formed in the deposited film besides TiO2. 2018-09-05T02:55:28Z 2018-09-05T02:55:28Z 2016-11-25 Journal 02578972 2-s2.0-84971632038 10.1016/j.surfcoat.2016.05.063 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84971632038&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/55407 |
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Chemistry Materials Science Physics and Astronomy Dheerawan Boonyawan Panadda Waruriya Kullapop Suttiat Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
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© 2016 Elsevier B.V. In this work, the bioactive TiN-HA layer has been prepared by reactive DC magnetron sputtering system with co-axis target configuration on the polyetheretherketone (PEEK) bio-inert material. The proper plasma conditions used to deposit TiN-HA film on PEEK were carried out by the optical emission spectroscopy (OES). The relationship between the chemical composition of plasma to sputtering pressure, discharge voltage, duty cycle and the content of nitrogen gas were considered. The plasma emission intensity raised to the maximum level when the N2content was 0.6 sccm. The voltage was ranged about 500–700 V for the sputtering pressure at 3–7 mTorr and reduced to below 500 V when the pressure increased to more than 7 mTorr. The clear as-deposited films with high refractive index were observed and found to reduce surface contact angle as much lower as 10°. X-ray photoelectron spectroscopy (XPS) result revealed TiOH was also formed in the deposited film besides TiO2. |
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Dheerawan Boonyawan Panadda Waruriya Kullapop Suttiat |
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Dheerawan Boonyawan Panadda Waruriya Kullapop Suttiat |
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Dheerawan Boonyawan |
title |
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
title_short |
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
title_full |
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
title_fullStr |
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
title_full_unstemmed |
Characterization of titanium nitride–hydroxyapatite on PEEK for dental implants by co-axis target magnetron sputtering |
title_sort |
characterization of titanium nitride–hydroxyapatite on peek for dental implants by co-axis target magnetron sputtering |
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2018 |
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https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84971632038&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/55407 |
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