Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning

This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using...

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Main Authors: Tai Chou Lee, Pei Chun Chen, Ting Ying Lai, Wirote Tuntiwechapikul, Jun Hyun Kim, T. Randall Lee
Format: Journal
Published: 2018
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http://cmuir.cmu.ac.th/jspui/handle/6653943832/60502
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spelling th-cmuir.6653943832-605022018-09-10T03:44:01Z Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning Tai Chou Lee Pei Chun Chen Ting Ying Lai Wirote Tuntiwechapikul Jun Hyun Kim T. Randall Lee Materials Science This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13-C16) provide better protection against etching than the shorter chain-length ADTCAs (C10-C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications. © 2008 Elsevier B.V. All rights reserved. 2018-09-10T03:44:01Z 2018-09-10T03:44:01Z 2008-08-30 Journal 01694332 2-s2.0-49549111582 10.1016/j.apsusc.2008.05.192 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=49549111582&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/60502
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Materials Science
spellingShingle Materials Science
Tai Chou Lee
Pei Chun Chen
Ting Ying Lai
Wirote Tuntiwechapikul
Jun Hyun Kim
T. Randall Lee
Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
description This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13-C16) provide better protection against etching than the shorter chain-length ADTCAs (C10-C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications. © 2008 Elsevier B.V. All rights reserved.
format Journal
author Tai Chou Lee
Pei Chun Chen
Ting Ying Lai
Wirote Tuntiwechapikul
Jun Hyun Kim
T. Randall Lee
author_facet Tai Chou Lee
Pei Chun Chen
Ting Ying Lai
Wirote Tuntiwechapikul
Jun Hyun Kim
T. Randall Lee
author_sort Tai Chou Lee
title Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
title_short Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
title_full Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
title_fullStr Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
title_full_unstemmed Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
title_sort aliphatic dithiocarboxylic acids: new adsorbates for soft lithographic patterning
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=49549111582&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60502
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