Ion penetration depth in the plant cell wall
This study investigates the depth of ion penetration in plant cell wall material. Based on the biological structure of the plant cell wall, a physical model is proposed which assumes that the wall is composed of randomly orientated layers of cylindrical microfibrils made from cellulose molecules of...
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2014
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th-cmuir.6653943832-61042014-08-30T03:23:50Z Ion penetration depth in the plant cell wall Yu L.D. Vilaithong T. Phanchaisri B. Apavatjrut P. Anuntalabhochai S. Evans P. Brown I.G. Gamo K.Ohdomari I.Itoh H.Iwaki M. This study investigates the depth of ion penetration in plant cell wall material. Based on the biological structure of the plant cell wall, a physical model is proposed which assumes that the wall is composed of randomly orientated layers of cylindrical microfibrils made from cellulose molecules of C6H12O6. With this model, we have determined numerical factors for ion implantation in the plant cell wall to correct values calculated from conventional ion implantation programs. Using these correction factors, it is possible to apply common ion implantation programs to estimate the ion penetration depth in the cell for bioengineering purposes. These estimates are compared with measured data from experiments and good agreement is achieved. © 2003 Elsevier Science B.V. All rights reserved. 2014-08-30T03:23:50Z 2014-08-30T03:23:50Z 2003 Conference Paper 0168583X 10.1016/S0168-583X(03)00840-1 61057 NIMBE http://www.scopus.com/inward/record.url?eid=2-s2.0-0038075165&partnerID=40&md5=0c8c4862b4d9cdd1336dd13b968f5feb http://cmuir.cmu.ac.th/handle/6653943832/6104 English |
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This study investigates the depth of ion penetration in plant cell wall material. Based on the biological structure of the plant cell wall, a physical model is proposed which assumes that the wall is composed of randomly orientated layers of cylindrical microfibrils made from cellulose molecules of C6H12O6. With this model, we have determined numerical factors for ion implantation in the plant cell wall to correct values calculated from conventional ion implantation programs. Using these correction factors, it is possible to apply common ion implantation programs to estimate the ion penetration depth in the cell for bioengineering purposes. These estimates are compared with measured data from experiments and good agreement is achieved. © 2003 Elsevier Science B.V. All rights reserved. |
author2 |
Gamo K.Ohdomari I.Itoh H.Iwaki M. |
author_facet |
Gamo K.Ohdomari I.Itoh H.Iwaki M. Yu L.D. Vilaithong T. Phanchaisri B. Apavatjrut P. Anuntalabhochai S. Evans P. Brown I.G. |
format |
Conference or Workshop Item |
author |
Yu L.D. Vilaithong T. Phanchaisri B. Apavatjrut P. Anuntalabhochai S. Evans P. Brown I.G. |
spellingShingle |
Yu L.D. Vilaithong T. Phanchaisri B. Apavatjrut P. Anuntalabhochai S. Evans P. Brown I.G. Ion penetration depth in the plant cell wall |
author_sort |
Yu L.D. |
title |
Ion penetration depth in the plant cell wall |
title_short |
Ion penetration depth in the plant cell wall |
title_full |
Ion penetration depth in the plant cell wall |
title_fullStr |
Ion penetration depth in the plant cell wall |
title_full_unstemmed |
Ion penetration depth in the plant cell wall |
title_sort |
ion penetration depth in the plant cell wall |
publishDate |
2014 |
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http://www.scopus.com/inward/record.url?eid=2-s2.0-0038075165&partnerID=40&md5=0c8c4862b4d9cdd1336dd13b968f5feb http://cmuir.cmu.ac.th/handle/6653943832/6104 |
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1681420551062552576 |