Ion penetration depth in the plant cell wall

• المؤلفون الرئيسيون: Yu L.D., Vilaithong T., Phanchaisri B., Apavatjrut P., Anuntalabhochai S., Evans P., Brown I.G.
• مؤلفون آخرون: Gamo K.Ohdomari I.Itoh H.Iwaki M.
• التنسيق: Conference or Workshop Item
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-0038075165&partnerID=40&md5=0c8c4862b4d9cdd1336dd13b968f5feb; http://cmuir.cmu.ac.th/handle/6653943832/6104

This study investigates the depth of ion penetration in plant cell wall material. Based on the biological structure of the plant cell wall, a physical model is proposed which assumes that the wall is composed of randomly orientated layers of cylindrical microfibrils made from cellulose molecules of C6H12O6. With this model, we have determined numerical factors for ion implantation in the plant cell wall to correct values calculated from conventional ion implantation programs. Using these correction factors, it is possible to apply common ion implantation programs to estimate the ion penetration depth in the cell for bioengineering purposes. These estimates are compared with measured data from experiments and good agreement is achieved. © 2003 Elsevier Science B.V. All rights reserved.