Surface modification of γ-TiAl alloys by acetylene plasma deposition
Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increas...
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th-cmuir.6653943832-615712018-09-11T09:01:53Z Surface modification of γ-TiAl alloys by acetylene plasma deposition Suparut Narksitipan Titipun Thongtem Michael McNallan Somchai Thongtem Chemistry Materials Science Physics and Astronomy Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved. 2018-09-11T08:55:19Z 2018-09-11T08:55:19Z 2006-10-15 Journal 01694332 2-s2.0-33748980224 10.1016/j.apsusc.2005.11.086 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33748980224&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61571 |
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Chemistry Materials Science Physics and Astronomy Suparut Narksitipan Titipun Thongtem Michael McNallan Somchai Thongtem Surface modification of γ-TiAl alloys by acetylene plasma deposition |
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Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved. |
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Suparut Narksitipan Titipun Thongtem Michael McNallan Somchai Thongtem |
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Suparut Narksitipan Titipun Thongtem Michael McNallan Somchai Thongtem |
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Suparut Narksitipan |
title |
Surface modification of γ-TiAl alloys by acetylene plasma deposition |
title_short |
Surface modification of γ-TiAl alloys by acetylene plasma deposition |
title_full |
Surface modification of γ-TiAl alloys by acetylene plasma deposition |
title_fullStr |
Surface modification of γ-TiAl alloys by acetylene plasma deposition |
title_full_unstemmed |
Surface modification of γ-TiAl alloys by acetylene plasma deposition |
title_sort |
surface modification of γ-tial alloys by acetylene plasma deposition |
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2018 |
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https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33748980224&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61571 |
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