Surface modification of γ-TiAl alloys by acetylene plasma deposition

Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increas...

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Main Authors: Suparut Narksitipan, Titipun Thongtem, Michael McNallan, Somchai Thongtem
Format: Journal
Published: 2018
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http://cmuir.cmu.ac.th/jspui/handle/6653943832/61571
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spelling th-cmuir.6653943832-615712018-09-11T09:01:53Z Surface modification of γ-TiAl alloys by acetylene plasma deposition Suparut Narksitipan Titipun Thongtem Michael McNallan Somchai Thongtem Chemistry Materials Science Physics and Astronomy Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved. 2018-09-11T08:55:19Z 2018-09-11T08:55:19Z 2006-10-15 Journal 01694332 2-s2.0-33748980224 10.1016/j.apsusc.2005.11.086 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33748980224&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61571
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Chemistry
Materials Science
Physics and Astronomy
spellingShingle Chemistry
Materials Science
Physics and Astronomy
Suparut Narksitipan
Titipun Thongtem
Michael McNallan
Somchai Thongtem
Surface modification of γ-TiAl alloys by acetylene plasma deposition
description Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2(MJ47), have been modified by acetylene plasma deposition at bias voltages of -4, -5 and -6 kV for 3.6 × 103s (1 h) and 1.44 × 104s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at -6 kV for 1.44 × 104s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX. © 2005 Elsevier B.V. All rights reserved.
format Journal
author Suparut Narksitipan
Titipun Thongtem
Michael McNallan
Somchai Thongtem
author_facet Suparut Narksitipan
Titipun Thongtem
Michael McNallan
Somchai Thongtem
author_sort Suparut Narksitipan
title Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_short Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_full Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_fullStr Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_full_unstemmed Surface modification of γ-TiAl alloys by acetylene plasma deposition
title_sort surface modification of γ-tial alloys by acetylene plasma deposition
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33748980224&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/61571
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