Effect of Plasma Power on Copper Substrate Used for Synthesizing Carbon Nanotubes via Alcohol Catalytic Chemical Vapor Deposition (ACVD) Technique

• المؤلفون الرئيسيون: Sureewan Phunwaree, Wim Nhuapeng, Dheerawan Boonyawan, Wandee Thamjaree
• اللغة: English
• منشور في: Science Faculty of Chiang Mai University 2019
• الموضوعات: Low Pressure Plasma Treatment; Alcohol Catalytic Chemical Vapor Deposition (ACVD); Carbon nanotubes
• الوصول للمادة أونلاين: http://it.science.cmu.ac.th/ejournal/dl.php?journal_id=6729; http://cmuir.cmu.ac.th/jspui/handle/6653943832/66091

In this work, the authors attempted to modify a plasma treatment on copper substrate to increase its roughness surface by Low Pressure Plasma Treatment (LPPT). Plasma energy at the radio frequency of 13.56 MHz and the mixing gas between 30% Acetylene (C2H2) and 70% Hydrogen (H2) were used for treat...