Temperature programmed desorption of F-doped SnO<inf>2</inf>films deposited by inverted pyrosol technique

• Main Authors: S. Aukkaravittayapun, C. Thanachayanont, T. Theapsiri, W. Veerasai, Y. Sawada, T. Kondo, S. Tokiwa, T. Nishide
• Other Authors: Thailand National Metal and Materials Technology Center
• Format: Conference or Workshop Item
• Published: 2018
• Subjects: Chemistry; Physics and Astronomy
• Online Access: https://repository.li.mahidol.ac.th/handle/123456789/23153
• Institution: Mahidol University

Fluorine-doped tin dioxide (FTO) films were deposited on silicon wafers by inverted pyrosol technique using solutions with different doping concentration (F/Sn=0.00, 0.12, 0.75 and 2.50). The physical and electrical properties of the deposited films were analyzed by SEM, XRF, resistivity measurement...