Processing technologies for advanced Ge devices

by Loo, R, Hikavyy, A.Y, Witters, L, Schulze, A, Arimura, H, Cott, D, Mitard, J, Porret, C, Mertens, H, Ryan, P, Wall, J, Matney, K, Wormington, M, Favia, P, Richard, O, Bender, H, Thean, A, Horiguchi, N, Mocuta, D, Collaert, N
Published 2020