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Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
by Yue, J.M.P., Chim, W.K., Cho, B.J., Chan, D.S.H., Qin, W.H., Kim, Y.B., Jang, S.A., Yeo, I.S.
Published 2014
Get full textPublished 2014
Conference or Workshop Item
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