Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration

by Holland, M, Van Dal, M, Duriez, B, Oxland, R, Vellianitis, G, Doornbos, G, Afzalian, A, Chen, T.-K, Hsieh, C.-H, Ramvall, P, Vasen, T, Yeo, Y.-C, Passlack, M
Published 2020