Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration

Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration

10.1038/s41598-017-15025-0

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Bibliographic Details
Main Authors: Holland, M, Van Dal, M, Duriez, B, Oxland, R, Vellianitis, G, Doornbos, G, Afzalian, A, Chen, T.-K, Hsieh, C.-H, Ramvall, P, Vasen, T, Yeo, Y.-C, Passlack, M
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/178298
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/178298

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