Atomically flat and uniform relaxed III-V epitaxial films on silicon substrate for heterogeneous and hybrid integration

• Main Authors: Holland, M, Van Dal, M, Duriez, B, Oxland, R, Vellianitis, G, Doornbos, G, Afzalian, A, Chen, T.-K, Hsieh, C.-H, Ramvall, P, Vasen, T, Yeo, Y.-C, Passlack, M
• Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
• Format: Article
• Published: 2020
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/178298
• Institution: National University of Singapore

10.1038/s41598-017-15025-0