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Sher-Yi, C.
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Sher-Yi, C.
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Sher-Yi, C.
'
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Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure
by
Lee, Y.K.
,
Latt, K.M.
,
Osipowicz, T.
,
Sher
-
Yi
,
C
.
Published 2014
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2
Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure
by
Latt, K.M.
,
Sher
-
Yi
,
C
.
,
Osipowicz, T.
,
Lee, K.
,
Lee, Y.K.
Published 2014
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3
Comparative analysis and study of ionized metal plasma (IMP)-Cu and chemical vapor deposition (CVD)-Cu on diffusion barrier properties of IMP-TaN on SiO2
by
Lee, Y.K.
,
Latt, K.M.
,
JaeHyung, K.
,
Osipowicz, T.
,
Sher
-
Yi
,
C
.
,
Lee, K.
Published 2014
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