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$Should the Refractive Index at 633 nm Be Used to Characterize Silicon Nitride Films?$

Should the Refractive Index at 633 nm Be Used to Characterize Silicon Nitride Films?

由 HAMEIRI, ZIV, BOROJEVIC, NINO, MAI, LY, NANDAKUMAR, NAOMI, KIM, KYUNG, WINDERBAUM, SAUL
出版 2019

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Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination

Low-Absorbing and Thermally Stable Industrial Silicon Nitride Films With Very Low Surface Recombination

由 Hameiri, Ziv, Borojevic, Nino, Mai, Ly, Nandakumar, Naomi, Kim, Kyung, Winderbaum, Saul
出版 2019

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