Parallel near-field photolithography with metal-coated elastomeric masks

由 Wu, Jin, Yu, Cheng-han, Li, Shaozhou, Zou, Binghua, Liu, Yayuan, Zhu, Xiaoqun, Guo, Yuanyuan, Xu, Hongbo, Zhang, Weina, Zhang, Liping, Liu, Bin, Tian, Danbi, Huang, Wei, Sheetz, Michael P., Huo, Fengwei
出版 2016