Parallel near-field photolithography with metal-coated elastomeric masks

Parallel near-field photolithography with metal-coated elastomeric masks

Langmuir

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Bibliographic Details
Main Authors: Wu, Jin, Yu, Cheng-han, Li, Shaozhou, Zou, Binghua, Liu, Yayuan, Zhu, Xiaoqun, Guo, Yuanyuan, Xu, Hongbo, Zhang, Weina, Zhang, Liping, Liu, Bin, Tian, Danbi, Huang, Wei, Sheetz, Michael P., Huo, Fengwei
Other Authors: MECHANOBIOLOGY INSTITUTE
Format: Article
Published: American Chemical Society 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/123525
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/123525

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