Formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by MOCVD -precursor versus substrate control

by Zybill, C.E., Huang, W.
Published 2014

In situ UPS study of the formation of FeSi films from cis-Fe(SiCl 3)2(CO)4

by Huang, W., Zybill, C.E., Luo, L., Hieringer, W., Huang, H.H.
Published 2014

UPS study of compounds with metal-silicon bonds: M(CO)nSiCl3 (M = Co, Mn; n = 4, 5) and Fe(CO)4(SiCl3)2

by Novak, I., Huang, W., Luo, L., Huang, H.H., Ang, H.G., Zybill, C.E.
Published 2014

Monomolecular silane films on glass surfaces - contact angle measurements

by Zybill, C.E., Ang, H.G., Lan, L., Choy, W.Y., Meng, E.F.K.
Published 2014

Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

by Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
Published 2014