Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Thin Solid Films

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Bibliographic Details
Main Authors: Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
FeSi films
Film composition
Film formation
Low-pressure chemical vapor deposition
Online Access:http://scholarbank.nus.edu.sg/handle/10635/94964
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/94964

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