Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Thin Solid Films

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Bibliographic Details
Main Authors:	Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
Other Authors:	CHEMISTRY
Format:	Article
Published:	2014
Subjects:	FeSi films Film composition Film formation Low-pressure chemical vapor deposition
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/94964
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-94964
record_format	dspace
spelling	sg-nus-scholar.10635-949642015-01-07T07:10:38Z Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L. CHEMISTRY PHYSICS FeSi films Film composition Film formation Low-pressure chemical vapor deposition Thin Solid Films 325 1-2 87-91 THSFA 2014-10-16T08:42:12Z 2014-10-16T08:42:12Z 1998-07-18 Article Luo, L.,Zybill, C.E.,Ang, H.G.,Lim, S.F.,Chua, D.H.C.,Lin, J.,Wee, A.T.S.,Tan, K.L. (1998-07-18). Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD. Thin Solid Films 325 (1-2) : 87-91. ScholarBank@NUS Repository. 00406090 http://scholarbank.nus.edu.sg/handle/10635/94964 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	FeSi films Film composition Film formation Low-pressure chemical vapor deposition
spellingShingle	FeSi films Film composition Film formation Low-pressure chemical vapor deposition Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L. Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
description	Thin Solid Films
author2	CHEMISTRY
author_facet	CHEMISTRY Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L.
format	Article
author	Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L.
author_sort	Luo, L.
title	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_short	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_full	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_fullStr	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_full_unstemmed	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_sort	substrate influence on the formation of fesi and fesi2 films from cis-fe(sicl3)2(co)4 by lpcvd
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/94964
_version_	1681091393463779328

Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

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