Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Thin Solid Films

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Bibliographic Details
Main Authors:	Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	FeSi films Film composition Film formation Low-pressure chemical vapor deposition
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/94964
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-94964
record_format	dspace
spelling	sg-nus-scholar.10635-949642024-11-13T13:30:32Z Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L. PHYSICS CHEMISTRY FeSi films Film composition Film formation Low-pressure chemical vapor deposition Thin Solid Films 325 1-2 87-91 THSFA 2014-10-16T08:42:12Z 2014-10-16T08:42:12Z 1998-07-18 Article Luo, L.,Zybill, C.E.,Ang, H.G.,Lim, S.F.,Chua, D.H.C.,Lin, J.,Wee, A.T.S.,Tan, K.L. (1998-07-18). Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD. Thin Solid Films 325 (1-2) : 87-91. ScholarBank@NUS Repository. 00406090 http://scholarbank.nus.edu.sg/handle/10635/94964 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	FeSi films Film composition Film formation Low-pressure chemical vapor deposition
spellingShingle	FeSi films Film composition Film formation Low-pressure chemical vapor deposition Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L. Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
description	Thin Solid Films
author2	PHYSICS
author_facet	PHYSICS Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L.
format	Article
author	Luo, L. Zybill, C.E. Ang, H.G. Lim, S.F. Chua, D.H.C. Lin, J. Wee, A.T.S. Tan, K.L.
author_sort	Luo, L.
title	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_short	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_full	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_fullStr	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_full_unstemmed	Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD
title_sort	substrate influence on the formation of fesi and fesi2 films from cis-fe(sicl3)2(co)4 by lpcvd
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/94964
_version_	1821222245354176512

Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

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