STRUKTUR LAPISAN TIPIS SNO2:SB-NIO DAN SIFAT OPTIK POLI ANILIN

Major effort has been spent during recent years in world wide attempts to achieve a new optical modulator technology. Various kinds of technology are available that potentially will be used for optical modulator. Which differ from one and each other mainly with respect to the choice of active materi...

Full description

Saved in:
Bibliographic Details
Main Author: NUGRAHA THAHA, YUDI
Format: Theses
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/11664
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Institut Teknologi Bandung
Language: Indonesia
Description
Summary:Major effort has been spent during recent years in world wide attempts to achieve a new optical modulator technology. Various kinds of technology are available that potentially will be used for optical modulator. Which differ from one and each other mainly with respect to the choice of active material, physical properties, substrate and manufacturing techniques. Among optical modulator technology, electrochromic is probably one of the most intensive studied. This technology has several advantages such as low driving voltage and low power consumption compared to liquid crystal display. In order to develop stable low cost electro chromic device. The choice of active material and manufacturing techniques is important point in fabricating of the electrochromic devices. This thesis review the studies done on the structure of multilayer thin film electrochromic SnO2:Sb-NiO by sol-gel dip coating and optical absorption of chromophore Polyaniline. SnO2:Sb (ATO) thin film as transparent conductive oxide was prepared by using sol-gel dip coating process onto soda lime glass. The structure formation, particle growth, and morphology were studied by scanning electron microscopy (SEM). The phase transformation of SnO2:Sb during sintering at 250 derajat C and 500 degrees C was characterized by X-ray diffraction. NiO as ion storage layer was prepared by using sol-gel dip coating onto SnO2:Sb (ATO) thin film substrate. The structure formation, particle growth, morphology were studied by scanning electron microscopy (SEM). The phase transformation of NiO during sintering at 250 degrees C and 500 degrees C was characterized by X-ray diffraction. Thin film polyaniline was prepared by screen printing technique. Optical absorption of polyaniline was studied by FTIR and Spectrofotometry Uv-visible. The phase of polyaniline was characterized by X-ray diffraction. Morphology of thin film polyaniline was studied by scanning electron microscopy (SEM). Base on structure and morphology analysis by scanning electron microscopy (SEM), it was found that the structure formation in SnO2:Sb-NiO thin film was controlled by temperature and diffusion during sintering. Increasing sintering temperature of SnO2:Sb and NiO give better crystallinity and increase particle size. The particle size of SnO2:Sb and NiO sintered 500 0C was reported 76 nm and 62 nm respectively. Base on optical absorption chromophore polyaniline studies, it was found hypsochromik shift from near infra red to 630 nm when polyaniline chromopore emeraldine salt (ES) transform to poli aniline chromopore emeraldine base (EB). The diffraction studies done on the structure by XRD indicated polyaniline was semi crystalline material.