Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds

Thin Film Zinc Oxide (ZnO) is a transparent n-type semiconductor within visible light, useful as a transparent conductor for electronic devices and sensors. This undergraduate research is done by depositioning ZnO film on modified glass substrate with seed layer ZnO using spin coating method and...

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Main Author: Abdul Alim, Malik
Format: Final Project
Language:Indonesia
Online Access:https://digilib.itb.ac.id/gdl/view/36755
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Institution: Institut Teknologi Bandung
Language: Indonesia
id id-itb.:36755
spelling id-itb.:367552019-03-14T15:52:49ZDepisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds Abdul Alim, Malik Indonesia Final Project thin film, zinc oxide, CBD, optical properties. INSTITUT TEKNOLOGI BANDUNG https://digilib.itb.ac.id/gdl/view/36755 Thin Film Zinc Oxide (ZnO) is a transparent n-type semiconductor within visible light, useful as a transparent conductor for electronic devices and sensors. This undergraduate research is done by depositioning ZnO film on modified glass substrate with seed layer ZnO using spin coating method and Chemical Bath Deposition (CBD). Precursor for seed layer ZnO are Zinc Acetate and Ethanol, While Precursor for CBD solution are Zinc Nitrate and Hexamethyltetraamine (HMTA). Deposition of thin film ZnO varied by substrate without modification and with seed layer ZnO modification. Thin film ZnO characterized using X-Ray Diffraction (XRD), UV-Vis Spectrophotometer, and Scanning Electron Microscope (SEM). Optical properties of maximum transmittance obtained 27% for thin film ZnO on glass substrate without modification, and transmittance decreased along with the increase in seed layer ZnO on glass substrate. Bandgap value obtained 4,10 eV for thin film ZnO on substrate without modification, and bandgap decreased along with the increase in seed layer ZnO on glass substrate. Whole sample of thin film ZnO has similiar X-Ray diffraction pattern. For thin film ZnO that deposited on substrate without modification has strongest diffraction at (101) plane, while thin film ZnO on substrate modified seed layer ZnO having strongest diffraction at the (100) plane. Thin film ZnO that grows on the surface of modified substrate found in the form of microrod and nanorod, with diameter size of microrod 2 ?m and diameter size of nanorod 100 nm respectively. Microrod formed above the nanorod has the same size as microrod ZnO that grows on substrate without modification. The growth of microrod ZnO on substrate without modification and with modified substrate are driven by three dimension growth. As of the growth of nanorod ZnO on the substrate are driven by two dimension growth following structure formation of seed layer ZnO on the substrate. text
institution Institut Teknologi Bandung
building Institut Teknologi Bandung Library
continent Asia
country Indonesia
Indonesia
content_provider Institut Teknologi Bandung
collection Digital ITB
language Indonesia
description Thin Film Zinc Oxide (ZnO) is a transparent n-type semiconductor within visible light, useful as a transparent conductor for electronic devices and sensors. This undergraduate research is done by depositioning ZnO film on modified glass substrate with seed layer ZnO using spin coating method and Chemical Bath Deposition (CBD). Precursor for seed layer ZnO are Zinc Acetate and Ethanol, While Precursor for CBD solution are Zinc Nitrate and Hexamethyltetraamine (HMTA). Deposition of thin film ZnO varied by substrate without modification and with seed layer ZnO modification. Thin film ZnO characterized using X-Ray Diffraction (XRD), UV-Vis Spectrophotometer, and Scanning Electron Microscope (SEM). Optical properties of maximum transmittance obtained 27% for thin film ZnO on glass substrate without modification, and transmittance decreased along with the increase in seed layer ZnO on glass substrate. Bandgap value obtained 4,10 eV for thin film ZnO on substrate without modification, and bandgap decreased along with the increase in seed layer ZnO on glass substrate. Whole sample of thin film ZnO has similiar X-Ray diffraction pattern. For thin film ZnO that deposited on substrate without modification has strongest diffraction at (101) plane, while thin film ZnO on substrate modified seed layer ZnO having strongest diffraction at the (100) plane. Thin film ZnO that grows on the surface of modified substrate found in the form of microrod and nanorod, with diameter size of microrod 2 ?m and diameter size of nanorod 100 nm respectively. Microrod formed above the nanorod has the same size as microrod ZnO that grows on substrate without modification. The growth of microrod ZnO on substrate without modification and with modified substrate are driven by three dimension growth. As of the growth of nanorod ZnO on the substrate are driven by two dimension growth following structure formation of seed layer ZnO on the substrate.
format Final Project
author Abdul Alim, Malik
spellingShingle Abdul Alim, Malik
Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
author_facet Abdul Alim, Malik
author_sort Abdul Alim, Malik
title Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
title_short Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
title_full Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
title_fullStr Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
title_full_unstemmed Depisition and Characterization of Thin Film Zinc Oxide on Glass Subtrate Modified with Zinc Oxide Seeds
title_sort depisition and characterization of thin film zinc oxide on glass subtrate modified with zinc oxide seeds
url https://digilib.itb.ac.id/gdl/view/36755
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