ELECTROLESS DEPOSITION OF NI-P ALLOY ON AL-2024 USING ROTATING DISK ELECTRODE\'S MODEL
<b>Abstract :</b><p align=\"justify\">The deposition of electroless nickel has been widely investigated due to the interesting properties of Ni-P alloys, such as corrosion and wear resistances. All of the properties of electroless nickel deposits are composition and struc...
Saved in:
| Main Author: | |
|---|---|
| Format: | Theses |
| Language: | Indonesia |
| Subjects: | |
| Online Access: | https://digilib.itb.ac.id/gdl/view/5107 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |
| Summary: | <b>Abstract :</b><p align=\"justify\">The deposition of electroless nickel has been widely investigated due to the interesting properties of Ni-P alloys, such as corrosion and wear resistances. All of the properties of electroless nickel deposits are composition and structure dependent. This study was undertaken to gain a better understanding of deposition process each species. <br />
<p align=\"justify\">Electroless nickel deposition with simultaneous reactions of cathodic and anodic oxidation of reductants based on the mixed potential theory were applied The Buttle-Volmer equation was performed to calculate deposition potential and partial current density each species to predict the phosphorous content in Ni-P alloy film. <br />
<p align=\"justify\">The experiment shows that electroless nickel deposition using hypophosphite reductor occurs between potential range -0.574 to - 0.652 Volt. The maximum amount of phosphor is 12%. Rate of electroless nickel layering spans between 1.9 to 7.6 mAfcm2. The rate controlled using two reaction mechanisms: Metal deposition rate (catodhic reaction) is diffusion controlled while the oxidation of hypophosphite is electrochemical control. The relation between process variable and deposit rate can be simulated by a calculation program. |
|---|