ELECTROLESS DEPOSITION OF NI-P ALLOY ON AL-2024 USING ROTATING DISK ELECTRODE\'S MODEL

• Main Author: Herlambang , Karyanto
• Format: Theses
• Language: Indonesia
• Subjects: Teknik (Rekayasa, enjinering dan kegiatan berkaitan)
• Online Access: https://digilib.itb.ac.id/gdl/view/5107
• Institution: Institut Teknologi Bandung

<b>Abstract :</b><p align=\"justify\">The deposition of electroless nickel has been widely investigated due to the interesting properties of Ni-P alloys, such as corrosion and wear resistances. All of the properties of electroless nickel deposits are composition and structure dependent. This study was undertaken to gain a better understanding of deposition process each species. <br /> <p align=\"justify\">Electroless nickel deposition with simultaneous reactions of cathodic and anodic oxidation of reductants based on the mixed potential theory were applied The Buttle-Volmer equation was performed to calculate deposition potential and partial current density each species to predict the phosphorous content in Ni-P alloy film. <br /> <p align=\"justify\">The experiment shows that electroless nickel deposition using hypophosphite reductor occurs between potential range -0.574 to - 0.652 Volt. The maximum amount of phosphor is 12%. Rate of electroless nickel layering spans between 1.9 to 7.6 mAfcm2. The rate controlled using two reaction mechanisms: Metal deposition rate (catodhic reaction) is diffusion controlled while the oxidation of hypophosphite is electrochemical control. The relation between process variable and deposit rate can be simulated by a calculation program.