PENUMBUHAN LAPISAN TIPIS A-SI:H DENGAN METODA HW-PECVD DAN APLIKASINYA PADA TRANSISTOR LAPISAN TIPIS
<b>Abstrct:<p align=\"justify\"> <br /> <br /> <br /> Development of PECVD (Plasma Enhanced Chemical Vapour Deposition) system to be HW-PECVD (Hot Wire-Plasma Enhanced Chemical Vapour Deposition) has been carried out by the way of the tungsten coil filame...
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| Format: | Theses |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/5339 |
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| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |
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