ANALISIS KINETIKA DEPOSISI LAPISAN TIPIS ZNO YANG DITUMBUHKAN DENGAN METODE METALORGANIC CHEMICAL VAPOR DEPOSITION DAN METODE ATOMIC LAYER DEPOSITION
<b></i>Abstract : </b><i><p align=\"justify\"> <br /> In this study, models of deposition mechanism of ZnO thin film grown by metalorganic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) methods using dietylzinc (DEZ) and H<sub>...
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| Format: | Theses |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/5482 |
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| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |
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