Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography

• Main Authors: Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab
• Format: Article
• Language: English
• Published: 2007
• Online Access: http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf; http://journalarticle.ukm.my/1459/; http://www.ukm.my/jkukm/index.php/jkukm
• Institution: Universiti Kebangsaan Malaysia

One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark profile is asymmetric, a change...