Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor

This work reports the effect of doping concentration on the energy-band structure of semiconductor materials. The research focuses on the resultant values of bandgap energy and its depletion region (length/area), based on the initial concentrations of doping which are the donors and acceptors. The e...

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Main Authors: Faris Azim Ahmad Fajri, Faris Azim, Ahmad Fakhrurrazi, Ahmad Noorden, Azni, Abdul Aziz
Format: Conference or Workshop Item
Language:English
English
Published: Institute of Physics Publishing 2021
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Online Access:http://irep.iium.edu.my/73957/8/73957_Doping%20effect%20numerical%20comparison%20of%20band%20gap%20energy%20and%20active_SCOPUS.pdf
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http://irep.iium.edu.my/73957/
https://iopscience.iop.org/article/10.1088/1742-6596/1892/1/012031/pdf
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spelling my.iium.irep.739572022-09-20T08:53:32Z http://irep.iium.edu.my/73957/ Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor Faris Azim Ahmad Fajri, Faris Azim Ahmad Fakhrurrazi, Ahmad Noorden Azni, Abdul Aziz QC Physics This work reports the effect of doping concentration on the energy-band structure of semiconductor materials. The research focuses on the resultant values of bandgap energy and its depletion region (length/area), based on the initial concentrations of doping which are the donors and acceptors. The energy-band diagram is simulated by initializing the various materials’ properties of Gallium Nitride (GaN) and Gallium Arsenide (GaAs), and solving the Poisson’s equation derived from Maxwell’s equation. The equation is solved by applying the finite difference method (FDM) and using the Newton-Raphson method. Both of these materials are compared with different doping concentrations (1x1013cm-3-1x1017cm-3). Taking the GaAs properties as the controlled variable, the band structure is validated with literature findings. The measured band gap energy of GaN changes from 1.5215eV to 7.6689eV, and GaAs, from 1.1330eV to 5.6431eV. It increases with the proportion to the doping concentration increments. However, when obtaining both of the spatial active regions for GaN and GaAs, it reduce from (1.9990μm-0.0790μm)x1μm2 and from (1.9990μm-0.0890μm)x1μm2 respectively. The findings show the effect of doping concentration on the semiconductor energy-band structure. Thus, the numerical system is expected to be used as the determination of the internal quantum efficiency, and the output spectrum of light-emitting diode (LED) chip. Institute of Physics Publishing 2021-04-01 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/73957/8/73957_Doping%20effect%20numerical%20comparison%20of%20band%20gap%20energy%20and%20active_SCOPUS.pdf application/pdf en http://irep.iium.edu.my/73957/9/73957_Doping%20effect%20numerical%20comparison%20of%20band%20gap%20energy%20and%20active.pdf Faris Azim Ahmad Fajri, Faris Azim and Ahmad Fakhrurrazi, Ahmad Noorden and Azni, Abdul Aziz (2021) Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor. In: 7th International Conference on the Applications of Science and Mathematics, SCIEMATHIC 2021, 27- 28 October 2021, Virtual. https://iopscience.iop.org/article/10.1088/1742-6596/1892/1/012031/pdf 10.1088/1742-6596/1892/1/012031
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
English
topic QC Physics
spellingShingle QC Physics
Faris Azim Ahmad Fajri, Faris Azim
Ahmad Fakhrurrazi, Ahmad Noorden
Azni, Abdul Aziz
Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
description This work reports the effect of doping concentration on the energy-band structure of semiconductor materials. The research focuses on the resultant values of bandgap energy and its depletion region (length/area), based on the initial concentrations of doping which are the donors and acceptors. The energy-band diagram is simulated by initializing the various materials’ properties of Gallium Nitride (GaN) and Gallium Arsenide (GaAs), and solving the Poisson’s equation derived from Maxwell’s equation. The equation is solved by applying the finite difference method (FDM) and using the Newton-Raphson method. Both of these materials are compared with different doping concentrations (1x1013cm-3-1x1017cm-3). Taking the GaAs properties as the controlled variable, the band structure is validated with literature findings. The measured band gap energy of GaN changes from 1.5215eV to 7.6689eV, and GaAs, from 1.1330eV to 5.6431eV. It increases with the proportion to the doping concentration increments. However, when obtaining both of the spatial active regions for GaN and GaAs, it reduce from (1.9990μm-0.0790μm)x1μm2 and from (1.9990μm-0.0890μm)x1μm2 respectively. The findings show the effect of doping concentration on the semiconductor energy-band structure. Thus, the numerical system is expected to be used as the determination of the internal quantum efficiency, and the output spectrum of light-emitting diode (LED) chip.
format Conference or Workshop Item
author Faris Azim Ahmad Fajri, Faris Azim
Ahmad Fakhrurrazi, Ahmad Noorden
Azni, Abdul Aziz
author_facet Faris Azim Ahmad Fajri, Faris Azim
Ahmad Fakhrurrazi, Ahmad Noorden
Azni, Abdul Aziz
author_sort Faris Azim Ahmad Fajri, Faris Azim
title Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
title_short Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
title_full Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
title_fullStr Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
title_full_unstemmed Doping effect numerical comparison of band gap energy and active region range for GaN and GaAs based semiconductor
title_sort doping effect numerical comparison of band gap energy and active region range for gan and gaas based semiconductor
publisher Institute of Physics Publishing
publishDate 2021
url http://irep.iium.edu.my/73957/8/73957_Doping%20effect%20numerical%20comparison%20of%20band%20gap%20energy%20and%20active_SCOPUS.pdf
http://irep.iium.edu.my/73957/9/73957_Doping%20effect%20numerical%20comparison%20of%20band%20gap%20energy%20and%20active.pdf
http://irep.iium.edu.my/73957/
https://iopscience.iop.org/article/10.1088/1742-6596/1892/1/012031/pdf
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