Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique

• Main Authors: Ritikos, R., Goh, B.T., Sharif, K.A.M., Muhamad, M.R., Rahman, S.A.
• Format: Article
• Published: 2009
• Subjects: QC Physics
• Online Access: http://eprints.um.edu.my/7359/
• Institution: Universiti Malaya

Multilayer thin films consisting of a-CNx:H/nc-Si:H layers prepared by radio-frequency plasma enhanced chemical vapour (r.f, PECVD) deposition technique were studied. High optical reflectivity at a specific wavelength is one of major concern for its application. By using this technique, a-CNx:H/nc-S...