Formation of Si nanostructure using size reduction technique

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.

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Bibliographic Details
Main Authors:	Th., Shikra Dhahi, Uda, Hashim, Prof. Dr., N. M., Ahmed
Other Authors:	sthikra@yahoo.com
Format:	Working Paper
Language:	English
Published:	Universiti Malaysia Perlis (UniMAP) 2012
Subjects:	Si–SiO2 substrate Photolithography Scanning electron microscope (SEM)
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/21498
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Institution:	Universiti Malaysia Perlis
Language:	English

id	my.unimap-21498
record_format	dspace
spelling	my.unimap-214982012-10-21T08:47:24Z Formation of Si nanostructure using size reduction technique Th., Shikra Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed sthikra@yahoo.com Si–SiO2 substrate Photolithography Scanning electron microscope (SEM) International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia. A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used for the electrode. Two chrome masks are proposed to complete this work, the first mask for the nanogap pattern and a second mask for the electrode. With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several different nanometer dimensions. In this work, the proposed method is experimentally demonstrated by preparing the nanogaps on a Si–SiO2 substrate. The optical characterization that is applied to check the nanogap structure is by using the scanning electron microscope (SEM). 2012-10-21T08:47:23Z 2012-10-21T08:47:23Z 2010-10-16 Working Paper 978-967-5760-03-7 http://hdl.handle.net/123456789/21498 en Proceedings of the International Postgraduate Conference on Engineering (IPCE 2010) Universiti Malaysia Perlis (UniMAP) Centre for Graduate Studies
institution	Universiti Malaysia Perlis
building	UniMAP Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Malaysia Perlis
content_source	UniMAP Library Digital Repository
url_provider	http://dspace.unimap.edu.my/
language	English
topic	Si–SiO2 substrate Photolithography Scanning electron microscope (SEM)
spellingShingle	Si–SiO2 substrate Photolithography Scanning electron microscope (SEM) Th., Shikra Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed Formation of Si nanostructure using size reduction technique
description	International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.
author2	sthikra@yahoo.com
author_facet	sthikra@yahoo.com Th., Shikra Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed
format	Working Paper
author	Th., Shikra Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed
author_sort	Th., Shikra Dhahi
title	Formation of Si nanostructure using size reduction technique
title_short	Formation of Si nanostructure using size reduction technique
title_full	Formation of Si nanostructure using size reduction technique
title_fullStr	Formation of Si nanostructure using size reduction technique
title_full_unstemmed	Formation of Si nanostructure using size reduction technique
title_sort	formation of si nanostructure using size reduction technique
publisher	Universiti Malaysia Perlis (UniMAP)
publishDate	2012
url	http://dspace.unimap.edu.my/xmlui/handle/123456789/21498
_version_	1643793428642791424

Formation of Si nanostructure using size reduction technique

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