Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
Link to publisher's homepage at http://www.aip.org/
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American Institute of Physics
2013
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my.unimap-266332018-02-28T04:19:25Z Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization Uda, Hashim, Prof. Dr. uda@unimap.edu.my Biosensor CMOS process E-beam lithography Nanowires Silicon Link to publisher's homepage at http://www.aip.org/ Silicon nanowires (SiNWs) have attracted significant interest in the study because of their potential to impact applications from nanoscale electronics to biomedical engineering. E-Beam Lithography couple with standard CMOS process is employed to fabricate the device. The exposure doses for the resist layer are varied in the range of 50 μC/cm2 to 180 μC/cm2 at 20 kV accelerating voltage with a beam current of 0.075 nA. The nanowires resist masks are well developed with dimension of less than 100 nm in width for the dose exposure parameters of 80 μC/cm2, 100 μC/cm2 and 120 μC/cm2. It is found that, the smallest SiNW with diameter of 65 nm is well aligned with electrode pads. In terms of sensitivity, the device with smaller nanowire is found to be more sensitive as a result of the high surface-to-volume ratio. These results demonstrate that the in-house fabricated SiNWs biosensor is capable as a platform for label-free biosensing. 2013-07-13T05:44:04Z 2013-07-13T05:44:04Z 2012-06-06 Working Paper AIP Conference Proceedings, vol. 1502(1), 2012, pages 26-33 978-0-7354-1119-7 0094-243X http://proceedings.aip.org/resource/2/apcpcs/1502/1/26_1 http://hdl.handle.net/123456789/26633 en Proceedings of the International Conference on Nanotechnology - Research and Commercialization (ICONT) 2011 American Institute of Physics |
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English |
| topic |
Biosensor CMOS process E-beam lithography Nanowires Silicon |
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Biosensor CMOS process E-beam lithography Nanowires Silicon Uda, Hashim, Prof. Dr. Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| description |
Link to publisher's homepage at http://www.aip.org/ |
| author2 |
uda@unimap.edu.my |
| author_facet |
uda@unimap.edu.my Uda, Hashim, Prof. Dr. |
| format |
Working Paper |
| author |
Uda, Hashim, Prof. Dr. |
| author_sort |
Uda, Hashim, Prof. Dr. |
| title |
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| title_short |
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| title_full |
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| title_fullStr |
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| title_full_unstemmed |
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization |
| title_sort |
silicon nanowire sensor by mix and match lithography process: fabrication and characterization |
| publisher |
American Institute of Physics |
| publishDate |
2013 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/26633 |
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1643803349298970624 |