Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler

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Main Authors: Qazi Mohammad, Humayun, Uda, Hashim, Prof. Dr.
Other Authors: uda@unimap.edu.my
Format: Article
Language:English
Published: Scientific.Net 2014
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Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/32126
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Institution: Universiti Malaysia Perlis
Language: English
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spelling my.unimap-321262014-02-24T04:53:14Z Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler Qazi Mohammad, Humayun Uda, Hashim, Prof. Dr. uda@unimap.edu.my qhumayun2@gmail.com Chrome mask Lab-on-chip Microgap Photoresist Spin coating Surface nanoprofiler Link to publisher's homepage at http://www.scientific.net A compact nanolaboratory on single chip is one of the challenging tasks for future reproductively of sensitive and selective lab-on-chip. This paper reports a simple and controllable technique for patterning microgap structures on (PR-1 2000A) positive photoresist. For the pattern transformation conventional lithography technique was used integrated with precise resolution mask namely chrome mask. This technique provides an especially simple method for the formation of micro features sizes of gaps onto the photoresist. The thickness of developed microgap structures on photoresist directly relates with the coating speed of spin coater. 2014-02-24T04:53:14Z 2014-02-24T04:53:14Z 2012-12 Article Advanced Materials Research, vol.626, 2012, pages 942-947 1022-6680 http://dspace.unimap.edu.my:80/dspace/handle/123456789/32126 http://www.scientific.net/AMR.626.942 en Scientific.Net
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Chrome mask
Lab-on-chip
Microgap
Photoresist
Spin coating
Surface nanoprofiler
spellingShingle Chrome mask
Lab-on-chip
Microgap
Photoresist
Spin coating
Surface nanoprofiler
Qazi Mohammad, Humayun
Uda, Hashim, Prof. Dr.
Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
description Link to publisher's homepage at http://www.scientific.net
author2 uda@unimap.edu.my
author_facet uda@unimap.edu.my
Qazi Mohammad, Humayun
Uda, Hashim, Prof. Dr.
format Article
author Qazi Mohammad, Humayun
Uda, Hashim, Prof. Dr.
author_sort Qazi Mohammad, Humayun
title Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
title_short Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
title_full Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
title_fullStr Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
title_full_unstemmed Parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
title_sort parametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofiler
publisher Scientific.Net
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/32126
_version_ 1643796776310800384