Man-2403 resist development for electron beam lithography process

Man-2403 resist development for electron beam lithography process

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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Bibliographic Details
Main Authors: Nur Hamidah, Abdul Halim, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
Format: Working Paper
Language:English
Published: Universiti Malaysia Pahang 2010
Subjects:
E-beam lithography
Resist development
maN-2403
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8646
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Institution: Universiti Malaysia Perlis
Language: English

Internet

http://dspace.unimap.edu.my/xmlui/handle/123456789/8646

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