Man-2403 resist development for electron beam lithography process

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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Main Authors:	Nur Hamidah, Abdul Halim, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
Format:	Working Paper
Language:	English
Published:	Universiti Malaysia Pahang 2010
Subjects:	E-beam lithography Resist development maN-2403 Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/8646
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Institution:	Universiti Malaysia Perlis
Language:	English

id	my.unimap-8646
record_format	dspace
spelling	my.unimap-86462010-08-13T04:50:02Z Man-2403 resist development for electron beam lithography process Nur Hamidah, Abdul Halim Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor E-beam lithography Resist development maN-2403 Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The objective of this project is to observe the effect of exposure dose and development time to the physical structure of maN-2403 resist using scanning electron microscope (SEM) and atomic force microscopy (AFM). The incomplete development of exposed resist pattern caused bridging effect in ma-N2403 resist tone. 2010-08-13T04:50:02Z 2010-08-13T04:50:02Z 2009-06-20 Working Paper http://hdl.handle.net/123456789/8646 en Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 Universiti Malaysia Pahang
institution	Universiti Malaysia Perlis
building	UniMAP Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	Universiti Malaysia Perlis
content_source	UniMAP Library Digital Repository
url_provider	http://dspace.unimap.edu.my/
language	English
topic	E-beam lithography Resist development maN-2403 Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
spellingShingle	E-beam lithography Resist development maN-2403 Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Nur Hamidah, Abdul Halim Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor Man-2403 resist development for electron beam lithography process
description	Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.
format	Working Paper
author	Nur Hamidah, Abdul Halim Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor
author_facet	Nur Hamidah, Abdul Halim Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor
author_sort	Nur Hamidah, Abdul Halim
title	Man-2403 resist development for electron beam lithography process
title_short	Man-2403 resist development for electron beam lithography process
title_full	Man-2403 resist development for electron beam lithography process
title_fullStr	Man-2403 resist development for electron beam lithography process
title_full_unstemmed	Man-2403 resist development for electron beam lithography process
title_sort	man-2403 resist development for electron beam lithography process
publisher	Universiti Malaysia Pahang
publishDate	2010
url	http://dspace.unimap.edu.my/xmlui/handle/123456789/8646
_version_	1643789245706403840

Man-2403 resist development for electron beam lithography process

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