Optimization of 16 nm DG-FinFET using L25 orthogonal array of Taguchi statistical method

The impact of the optimization using Taguchi statistical method towards the electrical properties of a 16 nm double-gate FinFET (DG-FinFET) is investigated and analyzed. The inclusion of drive current (ION), leakage current (IOFF), and threshold voltage (VTH) as part of electrical properties present...

Full description

Saved in:
Bibliographic Details
Main Authors: Roslan A.F., Salehuddin F., Zain A.S.M., Kaharudin K.E., Ahmad I.
Other Authors: 57203514087
Format: Article
Published: Institute of Advanced Engineering and Science 2023
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Tenaga Nasional