Heteroepitaxial growth of 3C-SiC on Si substrates by rapid thermal triode plasma CVD using dimethylsilane at low temperature

The investigation of the dependence of the cubic silicon carbide (3C-SiC) film characteristics on the reaction pressures, growth temperatures and hydrogen dilution rates was carried out by rapid thermal triode plasma CVD using dimethylsilane as a source gas. The stoichiometric 3C-SiC films with good...

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Bibliographic Details
Main Authors: Hashim, Abdul Manaf, Kanji, Yasui
Format: Article
Language:English
English
Published: Penerbit UTM Press 2009
Subjects:
Online Access:http://eprints.utm.my/id/eprint/13363/2/AbdulManafHashim2009_HeteroepitaxialGrowth.pdf
http://eprints.utm.my/id/eprint/13363/1/163
http://eprints.utm.my/id/eprint/13363/
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Institution: Universiti Teknologi Malaysia
Language: English
English

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