Orientation stabilized rapid melting growth of thin (100) ge-on-insulator structures and their implementation in homoepitaxial growth

Integration of Ge on the Si platforms is essential for the development of next generation large-scale integrated circuits. The Ge-on-insulator (GOI) structure is suited for the realization of high-mobility transistors channels and as epitaxial templates for optoelectronic and spintronic materials. I...

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Bibliographic Details
Main Authors: Anisuzzaman, Mohammad, Muta, Shunpei, Hashim, Abdul Manaf, Sadoh, Taizoh
Format: Article
Published: 2013
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Online Access:http://eprints.utm.my/id/eprint/40959/
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Institution: Universiti Teknologi Malaysia

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